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Film thickness measuring device
Categories： News
Time of issue：2021-09-24 13:22
Line scan microscope film thickness measuring head
Use the measuring head developed by our company.
Line scanning film thickness measurement head, which can measure photoresist and OLED materials with high precision through white reflection spectrum film thickness analysis and processing.
feature
| Microspectroscopy | High-precision measurement of shape and film thickness changes in tiny areas |
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| line scan | By using the line scan method, the measurement length is variable, and a wide range of distribution evaluation can be performed. |
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| Scalability | Supports measurement over the entire surface of a large board by arranging multiple heads and extending them in the width direction |
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| Material properties | Equipped with refractive index and extinction coefficient measurement functions.Changes in material properties can be monitored and tracked |
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| Online measurement | Depending on configuration, inline support is also available |
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| other | Multilayer film analysis Film thickness distribution map Supports statistical processing of in-plane distribution |
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Measurement example
Example of evaluation of organic materials deposited using FHM (Fine Hybrid Mask) and vertical vapor deposition equipment
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Specifications (standard)
| Measurement methods | Line Scan (Push Bloom) White Reflectance Spectrometer |
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| Measurement Resolution (Specification vs. SiO2 Reference) | 10Å |
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| Measurement reproducibility (spec with SiO2 reference) | ± 2Å |
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| Measuring width | 704 μm (10x) 140 μm (50x) |
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| Measuring length (max) | 2000 μm to continuous (depending on device configuration) |
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