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Reticle Visual Inspection Equipment Gemini(AOI)
Photomasks for displays are becoming clearer and larger due to increased production of small and medium sized OLEDs and FPDs using G10.5 (about 3m x 3.4m) mother glass. Reticle detection device Gemini is a simplified high-precision X-axis air guide device, an active vibration isolation table combined with a high-rigidity stone table top three-dimensionally, a high-precision high-rigidity mask bracket, and a unique rotating mechanism, ceramic vertical air guide The original technology of the buoy technology and the internal CAD database conversion circuit are used for comparison and detection, as well as various detection logics such as "mura mapping" and "high-sensitivity detection function of micro-contact holes". The image processing engine provides high-speed, high-precision visual inspection, which meets 8K Photomask requirements for displays and small and medium organic EL displays. Additionally, the design is flexible enough to accommodate factory layouts such as semi-built-in vibration isolation tables and flat surfaces containing thin film handling systems for direct access to the AGV.
Mask defect correction equipment Sculptor(Repair)
Sculptor is a defect correction device specially designed for FPD photomask defect correction. Open defects (missing or missing patterns) can be corrected by gas window laser CVD. In addition, it is equipped with a laser optimized for repairing short defects (abnormal pattern connections) for high-quality defect correction. It also supports photomask defect correction with halftone patterns* (patterns of light passing through a metal film). *(Photo) Observation image of halftone pattern transmitted illumination (The shading part is displayed in black, the transparent part is displayed in gray, and the translucent part is displayed in dark gray)
Precision Coordinate Measuring Equipment Mercury SHR
Mercury SHR is a photomask coordinate measuring machine that achieves the highest level of measurement accuracy in the world. The device employs multiple techniques to measure giant photomasks with nanometer resolution. Air sliders and measuring stages with high positioning accuracy and high flatness, laser interferometers and linear encoders that control the position of the stage in nanometers, and the minimization of adverse environmental effects, etc. The advanced optomechanical system realizes the world's highest level of measurement accuracy. In addition, the accuracy calibration is performed using the original measurement software and the reference mask, and the error factors are completely corrected to ensure the high precision and reproducibility of the measurement.
