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Automatic coating and developing equipment Dual-1000
Automatic coating and developing equipment Dual-1000

Automatic coating and developing equipment Dual-1000

Since its establishment, Litho Tech Japan has focused on the research of lithography technology. It has a very comprehensive lithography technology, including hardware, software and processes, and provides high-performance lithography process equipment and photoresist analysis equipment. Become a wholly-owned subsidiary of VTEC in 2021, join the equipment and lithography technology business for semiconductor material production, research and development, continue to innovate, and provide products and services that meet customer needs

Contact UsTel: 86-021-64325386

  • Product description

  • The equipment is equipped with a photoresist spin coating unit and a resist developing unit, and can freely combine a hot plate, a cooling plate, an HMDS processing unit, a clean substrate transfer robot, etc. According to customer needs, we can provide substrates as small as 2 inches or less and wafers as large as 300mm.

    Be applicable:
    1. Coating materials such as g-line / i-line photoresist, polyimide, interlayer insulating film, wax, etc.;
    2. Chemical amplification coating materials such as EB photoresist, EUV photoresist, ArF / KrF photoresist;
    3. Use alkaline developer and organic developer for immersion development and spray development.

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