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Photoresist Flat Exposure Device VUVES-4700
Since its establishment, Litho Tech Japan has focused on the research of lithography technology. It has a very comprehensive lithography technology, including hardware, software and processes, and provides high-performance lithography process equipment and photoresist analysis equipment. Become a wholly-owned subsidiary of VTEC in 2021, join the equipment and lithography technology business for semiconductor material production, research and development, continue to innovate, and provide products and services that meet customer needs
- Product description
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Exposure device for 248nm and 193nm photoresist analysis
feature:
1. Equipped with a long life light source, which can be exposed at 248nm and 193nm.
2. ABC parameter measurement function
3. Exposure area 5mm×5mm
4. Outgas collection function (optional function)
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