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Photoresist Development Analyzer RDA-800
Since its establishment, Litho Tech Japan has focused on the research of lithography technology. It has a very comprehensive lithography technology, including hardware, software and processes, and provides high-performance lithography process equipment and photoresist analysis equipment. Become a wholly-owned subsidiary of VTEC in 2021, join the equipment and lithography technology business for semiconductor material production, research and development, continue to innovate, and provide products and services that meet customer needs
- Product description
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The photoresist development speed, calculated gamma value, contrast curve, surface insolubilization parameters and development parameters can be evaluated.
Rmax (5,000 nm/s) photoresists such as ArF resists can be processed through the simultaneous developer insertion mechanism of the wafer and lens.feature:
Number of monitors: 18 channels
Monitor wavelength: 470nm and 950nm (dual compatible)
Applicable photoresist film thickness: 80nm to 10μm
Others: developer temperature control function, automatic lens/chip insertion, automatic developer supply/drain function installation, compatible with organic solvents;
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