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Photoresist Development Analyzer RDA-790
Since its establishment, Litho Tech Japan has focused on the research of lithography technology. It has a very comprehensive lithography technology, including hardware, software and processes, and provides high-performance lithography process equipment and photoresist analysis equipment. Become a wholly-owned subsidiary of VTEC in 2021, join the equipment and lithography technology business for semiconductor material production, research and development, continue to innovate, and provide products and services that meet customer needs
- Product description
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The development speed of the photoresist can be evaluated, gamma value, contrast curve, surface insolubilization parameters and development parameters can be calculated.
feature:
Number of monitors: 18 channels
Monitor wavelength: 950nm
Applicable photoresist resist film thickness: 500nm～10μm
Others: Developer temperature control function, automatic wafer insertion, equipped with automatic developer supply and drainage functions
Optional function: monitoring wavelength 470nm
(Applicable photoresist film thickness 100nm ~ 1μm)
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